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2-((1,1-Dioxidohexahydro-3,5-methanocyclopenta[C][1,2]oxathiol-7-YL)oxy)-2-oxoethyl methacrylate

CAS 1135824-87-1

2-((1,1-Dioxidohexahydro-3,5-methanocyclopenta[C][1,2]oxathiol-7-YL)oxy)-2-oxoethyl methacrylate
Why do semiconductor materials use molecules with such complicated names? CAS 1135824-87-1 shows the logic: one part polymerizes, while the other tunes the photoresist film.
CAS 1135824-87-1 (SNBMA) packs two jobs into one photoresist-style monomer: a methacrylate double bond builds the polymer backbone, while a rigid, oxygen-rich sulfur-containing side group tunes the resulting film. In advanced lithography, side-chain chemistry can influence polarity, thermal behavior, developer response and pattern fidelity. A nanometer-scale image can begin with the design of a single monomer.
Published: 2026-09-17
View complete chemical information for 2-((1,1-Dioxidohexahydro-3,5-methanocyclopenta[C][1,2]oxathiol-7-YL)oxy)-2-oxoethyl methacrylate