Tetrakis(ethylmethylamido)zirconium
[CAS# 175923-04-3]

Identification

• Classification: Organic raw materials >> Organometallic compound >> Organic zirconium
• Name: Tetrakis(ethylmethylamido)zirconium
• Synonyms: Tetrakis(ethylmethylamino)zirconium; Tetrakis(methylethylamino) zirconium; Zirconium tetra(ethylmethylamide)
• Molecular Formula: 4(C₃H₈N).Zr
• Molecular Weight: 323.63
• CAS Registry Number: 175923-04-3
• EC Number: 623-196-5
• SMILES: CC[N-]C.CC[N-]C.CC[N-]C.CC[N-]C.[Zr+4]

Properties

• Boiling point: 81 °C (0.1 mmHg)

Safety Data

• Hazard Symbols: GHS02;GHS05;GHS07 Danger
• Risk Statements: H225-H226-H261-H314-H315-H319-H335
• Safety Statements: P210-P231+P232-P233-P240-P241-P242-P243-P260-P261-P264-P264+P265-P271-P280-P301+P330+P331-P302+P352-P302+P361+P354-P303+P361+P353-P304+P340-P305+P351+P338-P305+P354+P338-P316-P319-P321-P332+P317-P337+P317-P362+P364-P363-P370+P378-P402+P404-P403+P233-P403+P235-P405-P501

Hazard Classification

Hazard	Class	Category Code	Hazard Statement
Flammable liquids	Flam. Liq.	2	H225
Specific target organ toxicity - single exposure	STOT SE	3	H335
Skin irritation	Skin Irrit.	2	H315
Substances or mixtures which in contact with water emit flammable gases	Water-react.	2	H261
Eye irritation	Eye Irrit.	2	H319
Skin corrosion	Skin Corr.	1B	H314
Acute toxicity	Acute Tox.	4	H302
Skin corrosion	Skin Corr.	1	H314

Discovery and Applications

Tetrakis(ethylmethylamido)zirconium, with the chemical formula Zr(NMe2Et)4, is a coordination compound of zirconium. This compound is notable for its role in various chemical applications and its unique structural properties. It was first synthesized in the mid-20th century as part of research into metal amide complexes and their applications in organometallic chemistry.

The synthesis of tetrakis(ethylmethylamido)zirconium involves the reaction of zirconium tetrachloride with ethylmethylamine in the presence of a suitable base. The reaction results in the replacement of chloride ligands with ethylmethylamide groups, forming the final tetrakis complex. The compound features a zirconium center surrounded by four ethylmethylamide ligands, which influence its reactivity and stability.

In terms of applications, tetrakis(ethylmethylamido)zirconium is primarily used in the field of chemical vapor deposition (CVD) for the production of thin films and coatings. Its ability to decompose at relatively low temperatures makes it an ideal precursor for the deposition of zirconium-containing films, which are crucial in various electronic and optical applications. The compound is particularly valued for its role in the deposition of zirconium dioxide (ZrO2) films, which are used in dielectric coatings, sensors, and as protective layers in semiconductor devices.

Additionally, tetrakis(ethylmethylamido)zirconium plays a role in the development of advanced materials and catalysts. Its reactivity with other organic and inorganic compounds allows for the synthesis of new materials with tailored properties. In catalyst development, it is used as a precursor for zirconium-based catalysts that facilitate various chemical reactions, including polymerization and hydrocarbon transformations.

The compound's structural features, including the nature of its ligands and the coordination environment around the zirconium center, are subjects of ongoing research. Understanding these features helps in optimizing its applications and in designing new zirconium-based compounds with specific properties.

Overall, tetrakis(ethylmethylamido)zirconium represents a significant advancement in coordination chemistry and materials science. Its discovery and subsequent applications have contributed to advancements in thin film deposition, catalyst development, and material synthesis.

References

2001. Alternating Layer Chemical Vapor Deposition (ALD) of Metal Silicates and Oxides for Gate Insulators. MRS Online Proceedings Library, 670.
DOI: 10.1557/proc-670-k2.4

2023. Buffer Layers for Nonvolatile Ferroelectric Memory Based on Hafnium Oxide. Russian Microelectronics, 52(Suppl 2).
DOI: 10.1134/s1063739723600486

2021. Optimization of substrate-selective atomic layer deposition of zirconia on electroplated copper using ethanol as both precursor reactant and surface pre-deposition treatment. Journal of Materials Science: Materials in Electronics, 32(4).
DOI: 10.1007/s10854-021-05267-0