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Tetrakis(dimethylamino)tin
[CAS# 1066-77-9]

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Identification
Classification Organic raw materials >> Organometallic compound >> Organotin
Name Tetrakis(dimethylamino)tin
Synonyms Tin(IV) dimethylamide
Molecular Structure CAS # 1066-77-9, Tetrakis(dimethylamino)tin, Tin(IV) dimethylamide
Molecular Formula C8H24N4Sn
Molecular Weight 295.01
CAS Registry Number 1066-77-9
EC Number 625-403-4
SMILES CN(C)[Sn](N(C)C)(N(C)C)N(C)C
Properties
Boiling point 51 ºC
Flash point -8 ºC
Safety Data
Hazard Symbols symbol symbol symbol   GHS02;GHS05;GHS07 Danger    Details
Hazard Statements H225-H302+H312+H332-H302-H312-H314-H318-H332    Details
Precautionary Statements P210-P233-P240-P241-P242-P243-P260-P261-P264-P264+P265-P270-P271-P280-P301+P317-P301+P330+P331-P302+P352-P302+P361+P354-P303+P361+P353-P304+P340-P305+P354+P338-P316-P317-P321-P330-P362+P364-P363-P370+P378-P403+P235-P405-P501    Details
Hazard Classification
up    Details
HazardClassCategory CodeHazard Statement
Acute toxicityAcute Tox.4H302
Skin corrosionSkin Corr.1BH314
Acute toxicityAcute Tox.4H312
Acute toxicityAcute Tox.4H332
Flammable liquidsFlam. Liq.2H225
Serious eye damageEye Dam.1H318
Flammable liquidsFlam. Liq.3H226
Substances or mixtures which in contact with water emit flammable gasesWater-react.1H260
Transport Information UN 2924
SDS Available
up Discovory and Applicatios
Tetrakis(dimethylamino)tin is an organotin compound with significant applications in materials science and organometallic chemistry. It consists of a tin atom coordinated to four dimethylamino groups, giving it the molecular formula Sn(NMe2)4. The compound is typically a colorless liquid and is air- and moisture-sensitive, requiring careful handling in inert environments. The discovery of tetrakis(dimethylamino)tin stemmed from the broader exploration of organometallic compounds for their potential in catalysis and materials synthesis, particularly in the semiconductor industry.

One of the primary applications of tetrakis(dimethylamino)tin is as a precursor in atomic layer deposition (ALD), a process used in the fabrication of thin films for semiconductor devices. Its volatility and thermal stability make it suitable for use in ALD processes, where precise, atomically thin layers of tin-containing compounds are deposited onto substrates. These films are crucial in developing advanced electronic components such as transistors and memory devices. Tetrakis(dimethylamino)tin is often used in the deposition of tin oxide (SnO2) or other tin-based materials, which are valued for their electrical conductivity and transparency.

In addition to its role in ALD, tetrakis(dimethylamino)tin is used in the synthesis of organotin compounds that serve as catalysts in organic reactions. Organotin compounds are known for their ability to catalyze a wide range of chemical transformations, including polymerization and coupling reactions. The presence of the dimethylamino ligands in tetrakis(dimethylamino)tin enhances its reactivity and solubility, making it an effective catalyst precursor in various synthetic processes.

The compound's versatility in both materials science and catalysis has made it an important focus in research aimed at developing more efficient and precise chemical processes. Its reactivity with different ligands and substrates allows for the customization of its chemical properties, making it adaptable to a wide range of applications in both industrial and academic settings.

Tetrakis(dimethylamino)tin continues to be explored for its potential in developing new materials with improved electronic and catalytic properties. Its unique molecular structure and favorable physical properties make it a valuable tool in advancing technologies in the semiconductor industry and beyond.
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