Hexachlorodisilane
[CAS# 13465-77-5]

Identification

• Classification: Chemical reagent >> Organic reagent >> Silane
• Name: Hexachlorodisilane
• Molecular Formula: Cl₆Si₂
• Molecular Weight: 268.89
• CAS Registry Number: 13465-77-5
• EC Number: 236-704-1
• SMILES: [Si]([Si](Cl)(Cl)Cl)(Cl)(Cl)Cl

Properties

• Boiling point: 144-146 ºC
• Refractive index: 1.475

Safety Data

• Hazard Symbols: GHS02;GHS05 Danger
• Hazard Statements: H225-H314
• Precautionary Statements: P210-P233-P240-P241-P242-P243-P260-P264-P280-P301+P330+P331-P302+P361+P354-P303+P361+P353-P304+P340-P305+P354+P338-P316-P321-P363-P370+P378-P403+P235-P405-P501

Hazard Classification

Hazard	Class	Category Code	Hazard Statement
Skin corrosion	Skin Corr.	1A	H314
Skin corrosion	Skin Corr.	1B	H314
Flammable liquids	Flam. Liq.	2	H225
Specific target organ toxicity - single exposure	STOT SE	3	H335
Substances or mixtures corrosive to metals	Met. Corr.	1	H290
Serious eye damage	Eye Dam.	1	H318

Discovory and Applicatios

Hexachlorodisilane, with the chemical formula Si2Cl6, is an organosilicon compound notable for its applications in materials science and industrial chemistry. Its discovery and development have played a significant role in the advancement of silicon-based technologies.

Hexachlorodisilane was first synthesized in the early 20th century as part of research into silicon halides, which are fundamental to the chemistry of silicon. The compound is synthesized through the reaction of silicon tetrachloride (SiCl4) with silicon in the presence of a reducing agent. This process results in the formation of hexachlorodisilane, which features a structure where two silicon atoms are bonded to each other and each is also bonded to three chlorine atoms.

In terms of applications, hexachlorodisilane is primarily used as a precursor in the production of silicon-based materials. One of its key roles is in the manufacture of silicon dioxide and silicon carbide. These materials are essential in the electronics industry for fabricating semiconductors and integrated circuits. Silicon dioxide, for instance, is used as an insulating layer in semiconductor devices, while silicon carbide is employed for its high thermal conductivity and hardness in various industrial applications.

Additionally, hexachlorodisilane is utilized in the production of high-purity silicon for photovoltaic cells. The compound is involved in processes that produce silicon with minimal impurities, which is critical for achieving the efficiency required in solar energy applications. The purified silicon derived from hexachlorodisilane is used in the manufacture of solar panels, contributing to the renewable energy sector.

Hexachlorodisilane also finds use in the field of material science, particularly in the development of advanced ceramics and coatings. The compound can be decomposed to form silicon-based films and coatings that are valued for their chemical resistance and mechanical properties. These materials are applied in various industries, including aerospace, automotive, and electronics, where they provide protection against wear and corrosion.

The handling of hexachlorodisilane requires stringent safety measures due to its reactive and corrosive nature. The compound is typically handled in controlled environments, such as fume hoods, and requires the use of protective equipment to prevent exposure. Proper storage and disposal protocols are also essential to ensure safety and environmental protection.

Overall, hexachlorodisilane is a crucial compound in the realm of silicon chemistry, with significant applications in electronics, renewable energy, and material science. Its role as a precursor for various silicon-based materials underscores its importance in modern industrial processes and technological advancements.